Semiconductor Ultrapure Water
OV-SG semiconductor-grade RO membrane elements.
OV-SG elements are designed for ultrapure-water preparation in semiconductor, microprocessor and silicon-material manufacturing. The series targets strong removal of low-molecular-weight organics and silica with low TOC release.
Product Advantages
Designed around the application.
- High TOC and silica removal
- Low TOC release
- Standard and low-energy options
- Designed for electronic-grade ultrapure water
Typical Applications
- Semiconductor fabrication
- Microprocessor manufacturing
- Silicon material production
- Ultrapure-water system pretreatment
Typical Properties
Model performance data.
Values are based on the defined test conditions below. Actual system performance depends on feed-water quality, pressure, temperature, recovery and pretreatment.
| Model | Stabilized rejection | Minimum rejection | Permeate flow | Active membrane area |
|---|---|---|---|---|
| SG400 | 99.6% | 95.0% | 11,500 GPD (43.5 m3/d) | 400 ft2 (37.2 m2) |
| SG400-LE | 99.5% | 90.0% | 11,500 GPD (43.5 m3/d) | 400 ft2 (37.2 m2) |
| SG440-LE | 99.5% | 90.0% | 12,000 GPD (45.4 m3/d) | 440 ft2 (40.9 m2) |
Standard Test Conditions
Test pressure225 psi (SG400) / 150 psi (LE models)
Feed concentration2,000 ppm NaCl (SG400) / 1,500 ppm (LE)
Feed temperature25 C
Single-element recovery15%
Operating & Cleaning Limits
Maximum operating pressure600 psi (4.14 MPa)
Maximum feed flow75 gpm (17 m3/h)
Maximum feed temperature45 C
Maximum feed SDI155
Free chlorine tolerance< 0.1 ppm
Continuous operating pH2-11
Cleaning pH1-13
Maximum element pressure drop15 psi (0.10 MPa)
Technical Document
OV-SG Series Datasheet
Download the original technical sheet used for the model data on this page.
Technical Inquiry